Industrial ultrapure water is the key support for modern high-end manufacturing. Its requirements for water purity are much higher than those for ordinary pure water or even laboratory water. It is necessary to almost completely remove ions, particles, organic matter, bacteria and soluble gases in the water. It is widely used in electronic semiconductors, photovoltaics, precision instruments, pharmaceutical preparations, biological experiments and other industries.
Ultrapure water has the following typical characteristics:
Extremely low conductivity: The resistivity of conventional electronic-grade ultrapure water must be ≥18.2MΩ·cm (25℃), and the equivalent conductivity is only about 0.055μS/cm, which is close to the theoretical limit of pure water.
TOC is extremely low: The total organic carbon (TOC) concentration is usually controlled at 5–50ppb to prevent organic impurities from affecting chip etching, optical coating or cell culture.
Strict control of particles/bacteria: The number of particles with a particle size >0.1μm is ≤1/mL, and the bacterial content is required to be less than 1CFU/mL. Key application scenarios even require sterile ultrapure water.
The process system has extremely high requirements: Ultrapure water preparation requires a multi-stage linkage system such as "RO+EDI+polished mixed bed+terminal precision filtration". Any unit failure may cause the entire production line to be contaminated and fail.
System-level design is carried out according to different customer industry standards (such as SEMI, GMP, USP, ISO) to ensure that the water production indicators fully meet the process requirements of chip cleaning, injection water, photovoltaic glass cleaning, etc.
Multi-stage reverse osmosis + EDI + precision polished mixed bed + ultraviolet sterilization + terminal 0.1/0.05μm fine filtration is used to ensure that the water resistivity is stable ≥18.2MΩ·cm, TOC ≤10ppb, and the system recovery rate is ≥75%.
The project implementation strictly complies with the clean area specifications, and uses high-purity pipes such as PVDF and PFA. The system is fully automated, has no dead ends, and is easy to verify.
Equipped with an online monitoring system, it can monitor key indicators such as resistivity, TOC, flow, and pressure in real time, and the linkage alarm system ensures stable operation of the equipment.
General contracting
Daily treatment capacity of copper-containing wastewater 2,500 tons, equalization tank-PH reaction tank-coagulation reaction tank-flocculation reaction tank-high-efficiency sedimentation tank-standard discharge; daily treatment capacity of chip cleaning organic wastewater 800 tons, equalization tank-micro-electrolysis reaction tank-Fenton reaction tank-PH reaction tank-coagulation reaction tank-flocculation reaction tank-high-efficiency sedimentation tank-anoxic tank-aerobic tank-sedimentation tank-standard discharge; ultrapure water preparation, 7,200 cubic meters/day, bag filtration, ultrafiltration (UF), multi-stage reverse osmosis (RO), EDI, polishing mixed bed, ultra-precision filtration
General contracting
1,000 tons/day (hydrofluoric acid wastewater) physical and chemical process Pure water production 55 tons/hour ultrafiltration + reverse osmosis + CEDI project
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